Fields
ChemistrySectors
Chemicals, Materials & Plant-based Materials
NEW ETCHING AGENT/SUPPORTING ELECTROLYTE
TECHNOLOGY
Porous silicon is currently synthetized using hydrofluoric acid as etching agent. The present invention describes a new etching agent/ supporting electrolyte without hydrofluoric acid. The porous silicon is prepared by electrochemical etching of metallurgical grade silicon using simple cell with multiple compartments. Pictures of the porous silicon obtained by the process are presented on the left.
APPLICATIONS
KEY BENEFITS
INTELLECTUAL PROPERTY
STAGE OF DEVELOPMENT
LABORATOIRES IMPLIQUÉS / CHERCHEURS