State-of-the-art nanofabrication tools (electronic beam lithography, reactive ion etching) can nowadays reach a few nanometer precision. This is still not accurate enough in optical applications such as metrology where collective behavior of resonators is targeted. Our method reaches picometer precision (3 orders of magnitude better than state-of-the-art). The method consists in shedding light on resonators, so that a light-activated chemical etching process can take place. When using the proper wavelength, light intensity is locally amplified by the resonator. The result is that the resonator is gently etched while its nearby environment remains intact. This technique allows as well collective tuning of several resonators for spectral alignment.
Competitive advantages :
Keywords : Nanophotonics, Optical resonators, Silicon photonics, High precision spectral tuning, Photoelectrochemical etching